The Foundations of Vacuum Coating TechnologyElsevier, 16 квіт. 2003 р. - 150 стор. The Foundations of Vacuum Coating Technology is a concise review of the developments that have led to the wide variety of applications of this technology. This book is a must have for materials scientists and engineers working with vacuum coating in the invention of new technologies or applications in all industries. With over 370 references, this is an excellent starting point for those who don't want to reinvent the wheel. In particular, the book is a valuable reference for those interested in researching proposed or existing patents. This unique book provides a starting point for more in-depth surveys of past and recent work in all aspects of vacuum coating. The author uses his extensive knowledge of the subject to draw comparisons and place the information into the proper context. This is particularly important for the patent literature where the terminology does not always match industry jargon. A section of acronyms for vacuum coating and glossary of terms at the end of the book are critical additions to the information every reader needs. |
Зміст
Chapter 7 Surface Preparation | 34 |
Summary | 37 |
Endnotes | 39 |
References | 43 |
Acronyms Used in Vacuum Coating | 61 |
Glossary of Terms for Vacuum Coating | 69 |
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Загальні терміни та фрази
Adhesion test alloy aluminum Ångstroms anode arc vaporization atoms called carbon chemical bond chemical vapor deposition chemical vapor precursor Coaters compound contamination corrosion D.M. Mattox density depo deposited film deposition process diffusion Edison elec Electrochemical electron beam electroplating emission energy etching Example film deposition film formation filter fixture Flash evaporation flow fluid formed gaseous gases gauge glass glow discharge heating high-energy hydrogen interface ion beam ion bombardment ion implantation ion plating ionization laser layer liquid magnetic field magnetron magnetron sputtering metal molecules molten nucleation optical optical coatings oxide particles PECVD Phys physical vapor deposition planar plasma source polymer produce properties pulsed PVD technology radiation reaction reactive deposition reactive gas region seal semiconductor processing silicon Society of Vacuum solvent species sputter deposition sputtering target structure substrate surface technique Technol temperature thermal evaporation thickness Thin Film tion U.S. Patent vacuum coating vacuum pump vaporization source voltage