Handbook of Physical Vapor Deposition (PVD) Processing

Передня обкладинка
Cambridge University Press, 19 вер. 2014 р. - 944 стор.
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications.

The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.

The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
 

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Зміст

Chapter 1 Introduction
29
Chapter 2 Substrate Real Surfaces and Surface Modification
56
Chapter 3 The LowPressure Gas and Vacuum Processing Environment
127
Chapter 4 The LowPressure Plasma Processing Environment
237
Chapter 5 Vacuum Evaporation and Vacuum Deposition
288
Chapter 6 Physical Sputtering and Sputter Deposition Sputtering
343
Chapter 7 Arc Vapor Deposition
406
Chapter 8 Ion Plating and Ion Beam Assisted Deposition
426
Chapter 10 Film Characterization and Some Basic Film Properties
569
Chapter 11 Adhesion and Deadhesion
616
Chapter 12 Cleaning
664
Chapter 13 External Processing Environment
744
Reference Material
768
Transfer of Technology from RD to Manufacturing
782
Glossary of Terms and Acronyms used in Surface Engineering
791
Index
906

Chapter 9 Atomistic Film Growth and Some GrowthRelated Film Properties
472

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